Energetic ion bombardment of SiO2 surfaces: Molecular dynamics simulations

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 16, Issue 5, 1998, Pages 3006-3019

  Abrams, Cameron F ^a   Graves, David B ^a  

^a University of California   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0032371642     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.581452     Document Type: Article

References (56)

1. B. P. Feuston and S. H. Garofalini, J. Chem. Phys. 89, 5818 (1988).
2. R. Smith, D. E. Harrison, Jr., and B. J. Garrison, Phys. Rev. B 40, 93 (1989).
3. R. Smith, D. E. Harrison, Jr., and B. J. Garrison, Nucl. Instrum. Methods Phys. Res. B 46, 1 (1990).
4. D. N. Ruzic and H. K. Chiu, J. Nucl. Mater. 162-164, 904 (1989).
5. L. E. Carter, S. Khodabandeh, P. C. Weakliem, and E. A. Carter, J. Chem. Phys. 100, 2277 (1994).
6. L. E. Carter and E. A. Carter, J. Vac. Sci. Technol. A 12, 2235 (1994).
7. L. E. Carter and E. A. Carter, Surf. Sci. 323, 39 (1995).
8. L. E. Carter and E. A. Carter, J. Phys. Chem. 100, 873 (1996).
9. T. A. Schoolcraft and B. J. Garrison, J. Vac. Sci. Technol. A 8, 3496 (1990).
10. T. A. Schoolcraft and B. J. Garrison, J. Am. Chem. Soc. 113, 8221 (1991).
11. T. A. Schoolcraft, A. M. Diehl, A. B. Steel, and B. J. Garrison, J. Vac. Sci. Technol. A 13, 1861 (1995).
12. P. C. Weakliem, C. J. Wu, and E. A. Carter, Phys. Rev. Lett. 69, 200 (1992).
13. P. C. Weakliem and E. A. Carter, J. Chem. Phys. 98, 737 (1993).
14. C. J. Wu and E. A. Carter, J. Am. Chem. Soc. 113, 9061 (1991).
15. C. J. Wu and E. A. Carter, Phys. Rev. B 45, 9065 (1992).
16. H. Feil, J. Dieleman, and B. J. Garrison, J. Appl. Phys. 74, 1303 (1993).
17. H. Feil, Phys. Rev. Lett. 74, 1879 (1995).
18. M. E. Barone and D. B. Graves, J. Appl. Phys. 77, 1263 (1995).
19. M. E. Barone and D. B. Graves, J. Appl. Phys. 78, 6604 (1995).
20. S. D. Athavale and D. J. Economou, J. Vac. Sci. Technol. A 13, 966 (1995).
21. M. E. Barone, T. O. Robinson, and D. B. Graves, IEEE Trans. Plasma Sci. 24, 77 (1996).
22. M. E. Barone and D. B. Graves, Plasma Sources Sci. Technol. 5, 1 (1996).
23. B. A. Helmer and D. B. Graves, S. Vac. Sci. Technol. A 15, 2252 (1997).
24. T. J. Dalton, J. C. Arnold, H. H. Sawin, S. Swan, and D. Corliss, J. Electrochem. Soc. 140, 2395 (1993).
25. A. C. Westerheim, A. H. Labun, J. H. Dubash, J. C. Arnold, H. H. Sawin, and V. Yu-Wang, J. Vac. Sci. Technol. A 13, 853 (1995).
26. G. S. Hwang, C. M. Anderson, M. J. Gordon, T. A. Moore, T. K. Minton, and K. P. Giapis, Phys. Rev. Lett. 77, 3049 (1996).
27. G. S. Hwang and K. P. Giapis, J. Vac. Sci. Technol. B 15, 70 (1996).
28. S. M. Rossnagel, C. Nichols, S. Hamaguchi, D. Ruzic, and R. Turkot, J. Vac. Sci. Technol. B 14, 1819 (1996).
29. J. C. Arnold and H. H. Sawin, J. Appl. Phys. 70, 5314 (1991).
30. G. S. Hwang and K. P. Giapis, Appl. Phys. Lett. 70, 2377 (1997).
31. L. Verlet, Phys. Rev. 159, 98 (1967).
32. S. H. Garofalini, J. Chem. Phys. 76, 3189 (1982).
33. S. H. Garofalini, J. Non-Cryst. Solids 120, 1 (1990).
34. E. B. Webb and S. H. Garofalini, J. Chem. Phys. 101, 10101 (1994).
35. E. B. Webb and S. H. Garofalini, J. Chem. Phys. 105, 792 (1996).
36. D. M. Zirl and S. H. Garofalini, J. Non-Cryst. Solids 122, 111 (1990).
37. D. C. Athanasopoulos and S. H. Garofalini, J. Chem. Phys. 197, 3775 (1992).
38. M. E. Barone and D. B. Graves, in Modeling and Simulation of Thin-Film Processing, edited by D. J. Srolovitz, C. A. Volkert, M. J. Fluss, and R. J. Kee [Mater. Res. Soc. Symp. Proc. 389, 29 (1995)].
39. M. E. Barone and D. B. Graves, in Modeling and Simulation of Thin-Film Processing, edited by D. J. Srolovitz, C. A. Volkert, M. J. Fluss, and R. J. Kee [Mater. Res. Soc. Symp. Proc. 389, 29 (1995)].
40. B. A. Helmer, D. B. Graves, and M. E. Barone, in Modeling and Simulation of Thin-Film Processing, edited by D. J. Srolovitz, C. A. Volkert, M. J. Fluss, and R. J. Kee [Mater. Res. Soc. Symp. Proc. 389, 23 (1995)].
41. B. A. Helmer, D. B. Graves, and M. E. Barone, in Modeling and Simulation of Thin-Film Processing, edited by D. J. Srolovitz, C. A. Volkert, M. J. Fluss, and R. J. Kee [Mater. Res. Soc. Symp. Proc. 389, 23 (1995)].
42. R. W. G. Wyckoff, Crystal Structures (Interscience, New York, 1948), pp. 312-313.
43. J. Feder, Fractals (Plenum, New York, 1988).
44. D. N. Ruzic, Nucl. Instrum. Methods Phys. Res. B 47, 118 (1990).
45. M. A. Shaheen and D. N. Ruzic, J. Vac. Sci. Technol. A 11, 3085 (1993).
46. B. Dubuc, J. F. Quiniou, C. Roques-Carmes, C. Tricot, and S. W. Zucker, Phys. Rev. A 39, 1500 (1989).
47. D. R. Askeland, The Science and Engineering of Materials (PWS-KENT, Boston, 1989), p. 57.
48. M. T. Robinson and I. M. Torrens, Phys. Rev. B 9, 5008 (1974).
49. K. M. Klein, C. Park, and A. F. Tasch, IEEE Trans. Electron Devices 39, 1614 (1992).
50. J. P. Biersack and L. G. Haggmark, Nucl. Instrum. Methods 174, 257 (1980).
51. W. Eckstein and J. Biersack, Nucl. Instrum. Methods Phys. Res. B 2, 550 (1984).
52. B. A. Helmer and D. B. Graves, J. Vac. Sci. Technol. A (submitted).
53. P. Sigmund, in Sputtering by Particle Bombardment I, Topics in Applied Physics, edited by R. Behrisch (Springer, Berlin, 1981), Chap. 2, pp. 9-71.
54. J. W. Butterbaugh, D. C. Gray, and H. H. Sawin, J. Vac. Sci. Technol. B 9, 1461 (1991).
55. D. C. Gray, I. Tepermeister, and H. H. Sawin, J. Vac. Sci. Technol. B 11, 1243 (1993).
56. T. F. Soules, J. Chem. Phys. 71, 4570 (1979).