Interfacial reactions of electroless nickel thin films on silicon

Applied Surface Science

Volumn 243, Issue 1-4, 2005, Pages 259-264

  Liu, C M ^a   Liu, W L ^a   Hsieh, S H ^a   Tsai, T K ^a   Chen, W J ^b  

^a NATIONAL FORMOSA UNIVERSITY   (Taiwan)

^b NATIONAL PINGTUNG UNIVERSITY OF SCIENCE AND TECHNOLOGY   (Taiwan)

Author keywords

Electroless; Epitaxial; Ni films; Silicide

Indexed keywords

ANNEALING; EPITAXIAL GROWTH; LEAKAGE CURRENTS; NICKEL COMPOUNDS; PHOSPHORUS; SILICON; SURFACE CHEMISTRY; THERMAL EFFECTS;

EUTECTIC TEMPERATURE; NICKEL SILICATE; SERIES RESISTANCE; SHEET RESISTANCE;

THIN FILMS;

EID: 14544273729     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2004.09.110     Document Type: Article

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