Electroless processes for micro- and nanoelectronics

Electrochimica Acta

Volumn 48, Issue 20-22, 2003, Pages 2987-2996

  Shacham Diamand, Yosi ^a   Inberg, A ^a   Sverdlov, Y ^a   Bogush, V ^a   Croitoru, N ^a   Moscovich, H ^a   Freeman, A ^a  

^a TEL AVIV UNIVERSITY   (Israel)

Author keywords

Alloys deposition; Barrier layers; Electroless deposition; Interconnects; Metallization; Semiconductor industry; Ultrathin films

Indexed keywords

ELECTROLESS PLATING; METALLIZING; MICROELECTROMECHANICAL DEVICES; MICROELECTRONICS; ORGANIC COMPOUNDS; ULTRATHIN FILMS;

METALLIC INTERCONNECTED NETWORKS;

NANOTECHNOLOGY;

EID: 0042469210     PISSN: 00134686     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0013-4686(03)00364-5     Document Type: Conference Paper

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