Comparison and uncertainties of standards for critical dimension atomic force microscope tip width calibration

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6518, Issue PART 1, 2007, Pages

  Dixson, Ronald ^a   Orji, Ndubuisi G ^a  

^a NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

Author keywords

Calibration; CD; CD AFM; Linewidth; Metrology; Reference measurement system; Standards; Traceability

Indexed keywords

CRITICAL DIMENSION (CD) METROLOGY; REFERENCE MEASUREMENT SYSTEMS; TRACEABILITY;

ATOMIC FORCE MICROSCOPY; CALIBRATION; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTOR DEVICE MANUFACTURE; UNCERTAINTY ANALYSIS;

STANDARDS;

EID: 35148887610     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.714032     Document Type: Conference Paper

References (30)

1. Y. Martin, H. K. Wickramasinghe, "Method for imaging sidewalls by atomic force microscopy," Applied Physics Letters 64, 2498-2500 (1994).
2. M. D. Lagerquist, W. Bither, R. Brouillette, "Improving SEM linewidth metrology by two-dimensional scanning force microscopy," SPIE Proceedings Vol. 2725, 494-503 (1996).
3. K. Wilder, B. Singh, W. H. Arnold, "Sub-0.35-micron critical dimension metrology using atomic force microscopy," SPIE Proceedings Vol. 2725, 540-554 (1996).
4. H. M. Marchman and Nichole Dunham, "AFM: A Valid Reference Tool?", SPIE Proceedings Vol. 3332, 2-9 (1998).
5. S. K. Yedur, B. Singh, "Evaluation of Atomic Force Microscopy: Comparison with Electrical CD Metrology and Low Voltage Scanning Electron Microscopy," SPIE Proceedings Vol. 3677, 43 - 52 (1999).
6. B. D. Bunday, M. Bishop, "Benchmarking of advanced CD-SEMs at the 130 nm CMOS Technology node," SPIE Proceedings Vol. 4689, 102 -115 (2002).
7. R. Dixson, A. Guerry, M. Bennett, T. Vorburger, M. Postek, "Toward Traceability for At Line AFM Dimensional Metrology," SPIE Proceedings Vol. 4689, 313-335 (2002).
8. N. Sullivan, R. Dixson, B. Bunday, M. Mastovich, P. Knutrud, P. Fabre, R. Brandom, "Electron Beam Metrology of 193 nm Resists at Ultra Low Voltage," SPIE Proceedings Vol. 5038, pp. 483-492 (2003).
9. R. Dixson, A. Guerry, M. Bennett, T. Vorburger, B. Bunday, "Implementation of a Reference Measurement System using CD-AFM," SPIE Proceedings Vol. 5038, 150-165 (2003).
10. P.R. Bingham, K.W. Tobin, M.H. Bennett, and P. Marmillion, "Preliminary results for mask metrology using spatial heterodyne interferometry," SPIE Proceedings Vol. 5256, pp. 1331-1342 (2003).
11. R. Dixson, A. Guerry, "Reference Metrology using a Next Generation CD-AFM", SPIE Proceedings Vol. 5375, 633-646 (2004).
12. B. Banke, C. Archie, M. Sendelbach, J. Robert, J. Slinkman, P. Kaszuba, R. Kontra, M. DeVries, E. Solecky, "Reducing measurement uncertainty drives the use of multiple technologies for supporting metrology," SPIE Proceedings Vol. 5375, pp. 133-150 (2004).
13. R. Dixson, J. Fu, N. Orji, W. Guthrie, R. Allen, M. Cresswell, "CD-AFM Reference Metrology at NIST and SEMATECH", SPIE Proceedings Vol. 5752, 324-336 (2005).
14. V. A. Ukraintsev, "A Comprehensive Test of Optical Scatterometry Readiness for 65 nm Technology Production," SPIE Proceedings Vol. 6152, 61521G-1-13 (2006).
15. N. Orji, A. Martinez, R. Dixson, J. Allgair, "Progress on Implementation of a CD-AFM based Reference Measurement System," SPIE Proceedings Vol. 6152 , 61520O-1-12 (2006).
16. M. W. Cresswell, E. H. Bogardus, J. V. Martinez de Pinillos, M. H. Bennett, R. A. Allen, W. F. Guthrie, C. E. Murabito, B. A. am Ende, L. W. Linholm, "CD Reference Materials for Sub-Tenth Micrometer Applications," SPIE Proceedings Vol. 4689, 116 -127 (2002).
17. R. A. Allen, M. W. Cresswell, C. E. Murabito, R. G. Dixson, E. H. Bogardus, "Critical Dimension Calibration Standards for ULSI Metrology," in Characterization and Metrology for ULSI Technology, AIP Conference Proceedings Vol. 683, 421-428 (2003).
18. R. G. Dixson, R. A. Allen, W. F. Guthrie, and M. W. Cresswell, "Traceable Calibration of Critical-Dimension Atomic Force Microscope Linewidth Measurements with Nanometer Uncertainty" J. Vac. Sci. Technol. B Vol. 23, 3028-3032 (2005).
19. M. Cresswell, R. Dixson, W. Guthrie, R. Allen, C. Murabito, B. Park, J. Martinez de Pinillos, and A. Hunt, "Critical Dimension Reference Features with Sub-Five Nanometer Uncertainty," SPIE Proceedings Vol. 5752, 288-303 (2005).
20. M. Tortonese, G.F. Lorusso, R.M. Blanquies, J. Prochazka; L. Grella, "Sub-50-nm isolated line and trench width artifacts for CD metrology", SPIE Proceedings Vol. 5375, 647-656 (2004).
21. R. Dixson, N. G. Orji, J. Fu, M. Cresswell, R. Allen, W. Guthrie, "Traceable Atomic Force Microscope Dimensional Metrology at NIST," SPIE Proceedings Vol. 6152, 61520P-1-11 (2006).
22. Guide to the Expression of Uncertainty in Measurement, International Organization for Standardization, Geneva (1995).
23. B. N. Taylor and C. E. Kuyatt, Guidelines for Evaluating and Expressing the Uncertainty of NIST Measurement Results, NIST Tech. Note 1297, (1994).
24. R. Dixson, W. Guthrie, M. Cresswell, R. Allen, N. G. Orji, "Single Crystal Critical Dimension Reference Materials (SCCDRM): Process Optimization for the Next Generation of Standards," to be published in SPIE Proceedings Vol. 6518, (2007).
25. R. Dixson, N. G. Orji, J. Fu, V. Tsai, E. D. Williams, R. Kacker, T. Vorburger, H. Edwards, D. Cook, P. West, R. Nyffenegger, "Silicon Single Atom Steps as AFM Height Standards," SPIE Proceedings Vol. 4344, 157 - 168 (2001).
26. A. C. Diebold, B. Foran, C. Kisielowski, D. A. Muller, S.J. Pennycook, E. Principe, S. Stemmer, "Thin Dielectric Film Thickness Determination by Advanced Transmission Electron Microscopy," Microscopy and Microanalysis 9, 493-508 (2003).
27. N. G. Orji, R. Dixson, B. D. Bunday, J. A. Allgair, "TEM Calibration Methods for Critical Dimension Standards," to be published in SPIE Proceedings Vol. 6518, (2007).
28. J. S. Villarrubia, A. E. Vladar, J. R. Lowney, M. T. Postek, "Scanning electron microscope analog of scatterometry," SPIE Proceedings Vol. 4689, 304 - 312 (2002).
29. R. Attota, R. Silver, M. Bishop, R. Dixson, "Optical Critical Dimension Measurement and Illumination Analysis Using the Through-focus Focus Metric," SPIE Proceedings Vol. 6152 , 61520K-1-11 (2006).
30. J. Potzick, E. Marx, M. Davidson, "Parametric Uncertainty in Optical Image Modeling," SPIE Proceedings Vol. 6349, 63494U-1-10 (2006).