CD reference features with sub-five nanometer uncertainty

Progress in Biomedical Optics and Imaging - Proceedings of SPIE

Volumn 5752, Issue I, 2005, Pages 288-303

  Cresswell, M W ^a   Dixson, R G ^a   Guthrie, W F ^a   Allen, R A ^a   Murabito, C E ^a   Park, B ^a   Martinez De Pinillos, J V ^a   Hunt, A ^b  

^a NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

^b Accurel Systems Int'l Corporation   (United States)

Author keywords

AFM; Atomic Force Microscopy; Calibration; CD; HRTEM; Linewidth; MEMS; Reference material

Indexed keywords

HRTEM; LINEWIDTH; MEMS; REFERENCE MATERIALS;

APPROXIMATION THEORY; ATOMIC FORCE MICROSCOPY; CALIBRATION; DIMENSIONAL STABILITY; HIGH RESOLUTION ELECTRON MICROSCOPY; MEASUREMENT THEORY; TRANSMISSION ELECTRON MICROSCOPY;

IMAGING TECHNIQUES;

EID: 24644498996     PISSN: 16057422     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.606807     Document Type: Conference Paper

References (15)

1. Report of Investigation of Prototype of RM 8110, Single-Crystal Critical Dimension Reference Materials, Semiconductor Electronics Division, Electronics and Electrical Engineering Laboratory, and Statistical Engineering Division, Information Technology Laboratory, National Institute of Standards and Technology, Gaithersburg, Maryland, April 30, 2001.
2. R. A. Allen, B. A. am Ende, M. W. Cresswell, C. E. Murabito, T. J. Headley, W. F. Guthrie, L. W. Linholm, C. H. Ellenwood, E.H. Bogardus, "Test Structures for Referencing Electrical Linewidth Measurements to Silicon Lattice Parameters Using HRTEM," IEEE Transactions on Semiconductor Manufacturing, Vol. 16, No. 2, pp. 239-248 (01-MAY-2003)
3. W Qin, "Direct Space (Nano)Crystallography Via High-Resolution Transmission-Electron Microscopy," A Dissertation Presented to the Faculty of the Graduate School of the University Of Missouri-Rolla, in partial fulfillment of the requirements for the degree of Doctor Of Philosophy In Physics, 2000.
4. M. W. Cresswell, B. Park, R. A. Allen, W. F. Guthrie, R. G. Dixson, C. E. Murabito, "Comparison of CD-Measurements Extracted from Test-Structure Features Having Linewidths in the Range 40 nm to 240 nm with SEM and HRTEM Imaging," to be presented at IEEE International Conference on Microelectronic Test Structures, March 2005, Leuven, Belgium.
5. A. E. Vladar, M. T. Postek, R. Vane, "Active Monitoring and Control of Electron-Beam-Induced Contamination," Proc. SPIE Vol. 4344, p. 835-843, Metrology, Inspection, and Process Control for Microlithography XV, Neal T. Sullivan; Ed. 08/2001.
6. T. C. Isabell, P. E. Fischione, C. O'Keefe, M. U. Guruz, and V. P. Dravid, "Plasma Cleaning And Its Applications For Electron Microscopy," Microsc. Microanal. 5, 126-135, 1999.
7. R. Dixson, A. Guerry, "Reference Metrology Using a Next Generation CD-AFM", SPIE Proceedings Vol. 5375, 633-646 (2004).
8. R. G. Dixson, "CD-AFM Reference Metrology at NIST and International SEMATECH", to be published in SPIE Proceedings Vol. 5752 (2005).
9. P. J. Mohr, and B. N. Taylor, "CODATA recommended values of the fundamental physical constants: 1998." J. Phys. Chem. Ref. Data, Vol. 28, no. 6, pp. 1713-1852 (1999).
10. This paper was also published in Reviews of Modern Physics, vol 72, no, 2, pp. 351-495 (2000). The values of these constants are also available online at physics.nist.gov/constants.
11. R. A. Allen, A. Hunt, C. E. Murabito, B. Park, W. F. Guthrie, and M. W. Cresswell, "Extraction of Critical Dimension Reference Feature CDs from New Test Structure Using HRTEM Imaging," to be presented at IEEE International Conference on Microelectronic Test Structures, March 2005, Leuven, Belgium.
12. B. A. am Ende, M. W. Cresswell, R. A. Allen, T. J. Headley, W. F. Guthrie, L. W. Linholm, E.H. Bogardus, C. E. Murabito, "Measurement of the Linewidth of Electrical Test-Structure Reference Features By Automated Phase-Contrast Image Analysis," Proc., 2002 ICMTS, IEEE 2002 International Conference on Microelectronic Test Structures, Cork, Ireland, Vol. 15, pp. 1-5 (01-APR-2002)
13. Guide the Expression of Uncertainty in Measurement, ISO, Geneva, Switzerland, 1993.
14. B. N. Taylor and C. E. Kuyatt, Guidelines for Evaluating and Expressing the Uncertainty of NIST Measurement Results, NIST TN 1297, 1994.
15. U.S. Divisional Patent Application Serial No. 09/834,482 "TEST CHIP CARRIER" by Michael Cresswell et al., Attorney Docket No. 3983-PA2D NIST Docket #99-008D.