Reducing measurement uncertainty drives the use of multiple technologies for supporting metrology

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5375, Issue PART 1, 2004, Pages 133-150

  Banke, Bill ^a   Archie, Chas ^a   Sendelbach, Matthew ^a   Robert, Jim ^a   Slinkman, Jim ^a   Kaszuba, Phil ^a   Kontra, Rick ^a   DeVries, Mick ^a   Solecky, Eric ^a  

^a IBM MICROELECTRONICS   (United States)

Author keywords

Accuracy; Calibration; CD; Critical Dimension; Metrology; Precision; Reference Measurement System; RMS; TMU; Total Measurement Uncertainty

Indexed keywords

ACCURACY; CD; CRITICAL DIMENSION (CD); PRECISION; REFERENCE MEASUREMENT SYSTEMS (RMS); RMS; TMU; TOTAL MEASUREMENT UNCERTAINTY;

CALIBRATION; DISTANCE MEASUREMENT; ETCHING; LITHOGRAPHY; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTOR DEVICE MANUFACTURE; TRANSMISSION ELECTRON MICROSCOPY;

MEASUREMENT THEORY;

EID: 4344674992     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.546880     Document Type: Conference Paper

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