Sub-0.35-um critical dimension metrology using atomic force microscopy

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 2725, Issue , 1996, Pages 540-554

  Wilder, Kathryn ^a   Singh, Bhanwar ^a   Arnold, William H ^a  

^a ADVANCED MICRO DEVICES   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; CRITICAL DIMENSION METROLOGY;

DISTANCE MEASUREMENT; ETCHING; PHOTORESISTS; PROCESS CONTROL; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTOR DEVICE MANUFACTURE;

MICROSCOPIC EXAMINATION;

EID: 0029770236     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (12)