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Volumn 6518, Issue PART 1, 2007, Pages

TEM calibration methods for critical dimension standards

Author keywords

CD AFM; HAADF STEM; HR TEM; Linewidth

Indexed keywords

INTERFERENCE PATTERNS; SCALE TRACEABILITY;

EID: 35148873567     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.713368     Document Type: Conference Paper
Times cited : (20)

References (19)
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    • Traceable Calibration of Critical-Dimension Atomic Force Microscope Linewidth Measurements with Nanometer Uncertainty
    • R. G. Dixson, R. A. Allen, W. F. Guthrie, and M. W. Cresswell, "Traceable Calibration of Critical-Dimension Atomic Force Microscope Linewidth Measurements with Nanometer Uncertainty" J. Vac. Sci. Technol. B Vol. 23, 3028-3032 (2005).
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  • 3
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    • Diebold, A.C.1
  • 4
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    • B-C Perng, J-H Shieh, S.-M. Jang, M.-S. Liang, R. Huang, L-C Chen, R-L Hwang, J. Hsu and D. Fong "Accurate In-line CD Metrology for Nanometer Semiconductor Manufacturing" Proc. of SPIE Vol. 6152 61520Q-1-9 (2006).
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    • CD-SEM Calibration with TEM to Reduce CD Measurement Error
    • C-Y Jeong, J Lee, K-Y Park, W. G. Lee and D-H. Lee "CD-SEM Calibration with TEM to Reduce CD Measurement Error" Proc. of SPIE Vol 4689, 747-755 (2002).
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    • The role of AFM in semiconductor technology development:the 65 nm technology node and beyond
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    • Implementation of a Reference Measurement System using CD-AFM
    • R. Dixson, A. Guerry, M. Bennett, T. Vorburger, B. Bunday, "Implementation of a Reference Measurement System using CD-AFM," Proc. of SPIE Vol. 5038, 150-165 (2003).
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    • Dixson, R.1    Guerry, A.2    Bennett, M.3    Vorburger, T.4    Bunday, B.5
  • 11
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    • N. G. Orji, R. G. Dixson, A. Martinez, B. D. Bunday, J. A. Allgair, T. V. Vorburger, Progress on Implementation of a CD-AFM-Based Reference Measurement System, to be published in SPIE Journal of Micro/Nanolithography, MEMS and MOEMS, 6 (2), (2007).
    • N. G. Orji, R. G. Dixson, A. Martinez, B. D. Bunday, J. A. Allgair, T. V. Vorburger, "Progress on Implementation of a CD-AFM-Based Reference Measurement System," to be published in SPIE Journal of Micro/Nanolithography, MEMS and MOEMS, Vol. 6 (2), (2007).
  • 12
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    • Single Crystal Critical Dimension Reference Materials (SCCDRM): Process Optimization for the Next Generation of Standards
    • to be published in
    • R. Dixson, W. Guthrie, M. Cresswell, R. Allen, N. G. Orji, "Single Crystal Critical Dimension Reference Materials (SCCDRM): Process Optimization for the Next Generation of Standards," to be published in SPIE Proceedings Vol. 6518, (2007).
    • (2007) SPIE Proceedings , vol.6518
    • Dixson, R.1    Guthrie, W.2    Cresswell, M.3    Allen, R.4    Orji, N.G.5
  • 13
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    • Higher order tip effects in traceable CD-AFM based linewidth measurements
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  • 14
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    • This paper was also published in Rev. Mod. Phys. 72 (2, 351-495 2000, The values of these constants are also available online at physics.nist.gov/constants
    • This paper was also published in Rev. Mod. Phys. 72 (2), 351-495 (2000). The values of these constants are also available online at physics.nist.gov/constants.
  • 16
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    • Leveraging LER to Minimize Linewidth Measurement Uncertainty in a Calibration Exercise
    • to be published in
    • J. Robert, B. Banke, R. Dixson, "Leveraging LER to Minimize Linewidth Measurement Uncertainty in a Calibration Exercise," to be published in Proc. of SPIE Vol. 6518 (2007).
    • (2007) Proc. of SPIE , vol.6518
    • Robert, J.1    Banke, B.2    Dixson, R.3
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    • Dimensional metrology of resist lines using a SEM model-based library approach
    • J. S. Villarrubia, A. E. Vladar, B. D. Bunday, and M. Bishop, "Dimensional metrology of resist lines using a SEM model-based library approach," Proc. of SPIE Vol. 5375, 199-209 (2004).
    • (2004) Proc. of SPIE , vol.5375 , pp. 199-209
    • Villarrubia, J.S.1    Vladar, A.E.2    Bunday, B.D.3    Bishop, M.4
  • 19
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    • Edge determination of polycrystalline silicon lines on gate oxide
    • J. S. Villarrubia, A. E. Vladar, J. R. Lowney, M. T. Postek, "Edge determination of polycrystalline silicon lines on gate oxide," SPIE Proceedings Vol. 4344, 147 - 156 (2001).
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    • Villarrubia, J.S.1    Vladar, A.E.2    Lowney, J.R.3    Postek, M.T.4


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.