-
1
-
-
0008463467
-
-
International Technology Roadmap for Semiconductors (ITRS, SIA) San Jose, CA
-
International Technology Roadmap for Semiconductors (ITRS) 2005 Semiconductor Industry Association (SIA) San Jose, CA
-
(2005)
Semiconductor Industry Association
-
-
-
2
-
-
29044449761
-
Traceable Calibration of Critical-Dimension Atomic Force Microscope Linewidth Measurements with Nanometer Uncertainty
-
R. G. Dixson, R. A. Allen, W. F. Guthrie, and M. W. Cresswell, "Traceable Calibration of Critical-Dimension Atomic Force Microscope Linewidth Measurements with Nanometer Uncertainty" J. Vac. Sci. Technol. B Vol. 23, 3028-3032 (2005).
-
(2005)
J. Vac. Sci. Technol. B
, vol.23
, pp. 3028-3032
-
-
Dixson, R.G.1
Allen, R.A.2
Guthrie, W.F.3
Cresswell, M.W.4
-
3
-
-
35148831605
-
Electron Microscopy -Based Measurement of Feature Thickness and Calibration of Reference Materials
-
edited by A. C. Diebold, Marcel-Dekker, New York
-
A. C. Diebold "Electron Microscopy -Based Measurement of Feature Thickness and Calibration of Reference Materials", in Handbook of Silicon Semiconductor Metrology, edited by A. C. Diebold, 851-863, Marcel-Dekker, New York, (2001).
-
(2001)
Handbook of Silicon Semiconductor Metrology
, pp. 851-863
-
-
Diebold, A.C.1
-
4
-
-
33745620140
-
-
B-C Perng, J-H Shieh, S.-M. Jang, M.-S. Liang, R. Huang, L-C Chen, R-L Hwang, J. Hsu and D. Fong Accurate In-line CD Metrology for Nanometer Semiconductor Manufacturing Proc. of SPIE 6152 61520Q-1-9 (2006).
-
B-C Perng, J-H Shieh, S.-M. Jang, M.-S. Liang, R. Huang, L-C Chen, R-L Hwang, J. Hsu and D. Fong "Accurate In-line CD Metrology for Nanometer Semiconductor Manufacturing" Proc. of SPIE Vol. 6152 61520Q-1-9 (2006).
-
-
-
-
5
-
-
0036029735
-
CD-SEM Calibration with TEM to Reduce CD Measurement Error
-
C-Y Jeong, J Lee, K-Y Park, W. G. Lee and D-H. Lee "CD-SEM Calibration with TEM to Reduce CD Measurement Error" Proc. of SPIE Vol 4689, 747-755 (2002).
-
(2002)
Proc. of SPIE
, vol.4689
, pp. 747-755
-
-
Jeong, C.-Y.1
Lee, J.2
Park, K.-Y.3
Lee, W.G.4
Lee, D.-H.5
-
6
-
-
24644454713
-
The role of AFM in semiconductor technology development:the 65 nm technology node and beyond
-
V. A. Ukraintsev, C. Baum, G. Zhang and C. L. Hall "The role of AFM in semiconductor technology development:the 65 nm technology node and beyond" Proc. of SPIE Vol. 5752, 127 -139 (2005).
-
(2005)
Proc. of SPIE
, vol.5752
, pp. 127-139
-
-
Ukraintsev, V.A.1
Baum, C.2
Zhang, G.3
Hall, C.L.4
-
8
-
-
0009947874
-
Scanning Transmission Electron Micorscopy: Z-Contrast
-
S. Amelinck, et al, ed, VCH, Weinheim
-
S. J Pennycook, D. E. Jesson, P. D. Nellist, M. F. Chsjolm, N. D. Browning "Scanning Transmission Electron Micorscopy: Z-Contrast" In: Electron Microscopy: Principles and Fundamentals (S. Amelinck, et al., ed.) VCH, Weinheim, (1997).
-
(1997)
Electron Microscopy: Principles and Fundamentals
-
-
Pennycook, S.J.1
Jesson, D.E.2
Nellist, P.D.3
Chsjolm, M.F.4
Browning, N.D.5
-
9
-
-
0742323368
-
Thin Dielectric Film Thickness Determination by Advanced Transmission Electron Microscopy
-
A. C. Diebold, B. Foran, C. Kisielowski, D. A. Muller, S. J. Pennycook, E. Principe, and S. Stemmer "Thin Dielectric Film Thickness Determination by Advanced Transmission Electron Microscopy" Microsc. Microanal. 9, 493-508, (2003).
-
(2003)
Microsc. Microanal
, vol.9
, pp. 493-508
-
-
Diebold, A.C.1
Foran, B.2
Kisielowski, C.3
Muller, D.A.4
Pennycook, S.J.5
Principe, E.6
Stemmer, S.7
-
10
-
-
0141500279
-
Implementation of a Reference Measurement System using CD-AFM
-
R. Dixson, A. Guerry, M. Bennett, T. Vorburger, B. Bunday, "Implementation of a Reference Measurement System using CD-AFM," Proc. of SPIE Vol. 5038, 150-165 (2003).
-
(2003)
Proc. of SPIE
, vol.5038
, pp. 150-165
-
-
Dixson, R.1
Guerry, A.2
Bennett, M.3
Vorburger, T.4
Bunday, B.5
-
11
-
-
34548043267
-
-
N. G. Orji, R. G. Dixson, A. Martinez, B. D. Bunday, J. A. Allgair, T. V. Vorburger, Progress on Implementation of a CD-AFM-Based Reference Measurement System, to be published in SPIE Journal of Micro/Nanolithography, MEMS and MOEMS, 6 (2), (2007).
-
N. G. Orji, R. G. Dixson, A. Martinez, B. D. Bunday, J. A. Allgair, T. V. Vorburger, "Progress on Implementation of a CD-AFM-Based Reference Measurement System," to be published in SPIE Journal of Micro/Nanolithography, MEMS and MOEMS, Vol. 6 (2), (2007).
-
-
-
-
12
-
-
34548040373
-
Single Crystal Critical Dimension Reference Materials (SCCDRM): Process Optimization for the Next Generation of Standards
-
to be published in
-
R. Dixson, W. Guthrie, M. Cresswell, R. Allen, N. G. Orji, "Single Crystal Critical Dimension Reference Materials (SCCDRM): Process Optimization for the Next Generation of Standards," to be published in SPIE Proceedings Vol. 6518, (2007).
-
(2007)
SPIE Proceedings
, vol.6518
-
-
Dixson, R.1
Guthrie, W.2
Cresswell, M.3
Allen, R.4
Orji, N.G.5
-
13
-
-
34247268333
-
Higher order tip effects in traceable CD-AFM based linewidth measurements
-
N. G. Orji, R. G. Dixson, "Higher order tip effects in traceable CD-AFM based linewidth measurements," Meas. Sci. Technol. 18, 448-455, (2007).
-
(2007)
Meas. Sci. Technol
, vol.18
, pp. 448-455
-
-
Orji, N.G.1
Dixson, R.G.2
-
14
-
-
0013311462
-
CODATA recommended values of the fundamental physical constants
-
P. J. Mohr and B. N. Taylor, CODATA recommended values of the fundamental physical constants: J. Phys. Chem. Ref. Data 28(6), 1713-1852 (1999).
-
(1999)
J. Phys. Chem. Ref. Data
, vol.28
, Issue.6
, pp. 1713-1852
-
-
Mohr, P.J.1
Taylor, B.N.2
-
15
-
-
0034341602
-
-
This paper was also published in Rev. Mod. Phys. 72 (2, 351-495 2000, The values of these constants are also available online at physics.nist.gov/constants
-
This paper was also published in Rev. Mod. Phys. 72 (2), 351-495 (2000). The values of these constants are also available online at physics.nist.gov/constants.
-
-
-
-
16
-
-
35148813620
-
Leveraging LER to Minimize Linewidth Measurement Uncertainty in a Calibration Exercise
-
to be published in
-
J. Robert, B. Banke, R. Dixson, "Leveraging LER to Minimize Linewidth Measurement Uncertainty in a Calibration Exercise," to be published in Proc. of SPIE Vol. 6518 (2007).
-
(2007)
Proc. of SPIE
, vol.6518
-
-
Robert, J.1
Banke, B.2
Dixson, R.3
-
17
-
-
4344600954
-
Dimensional metrology of resist lines using a SEM model-based library approach
-
J. S. Villarrubia, A. E. Vladar, B. D. Bunday, and M. Bishop, "Dimensional metrology of resist lines using a SEM model-based library approach," Proc. of SPIE Vol. 5375, 199-209 (2004).
-
(2004)
Proc. of SPIE
, vol.5375
, pp. 199-209
-
-
Villarrubia, J.S.1
Vladar, A.E.2
Bunday, B.D.3
Bishop, M.4
-
18
-
-
0036029340
-
Scanning electron microscope analog of scatterometry
-
J. S. Villarrubia, A. E. Vladar, J. R. Lowney, M. T. Postek, "Scanning electron microscope analog of scatterometry," SPIE Proceedings Vol. 4689, 304-312 (2002).
-
(2002)
SPIE Proceedings
, vol.4689
, pp. 304-312
-
-
Villarrubia, J.S.1
Vladar, A.E.2
Lowney, J.R.3
Postek, M.T.4
-
19
-
-
0034757352
-
Edge determination of polycrystalline silicon lines on gate oxide
-
J. S. Villarrubia, A. E. Vladar, J. R. Lowney, M. T. Postek, "Edge determination of polycrystalline silicon lines on gate oxide," SPIE Proceedings Vol. 4344, 147 - 156 (2001).
-
(2001)
SPIE Proceedings
, vol.4344
, pp. 147-156
-
-
Villarrubia, J.S.1
Vladar, A.E.2
Lowney, J.R.3
Postek, M.T.4
|