Toward traceability for at line AFM dimensional metrology

Proceedings of SPIE-The International Society for Optical Engineering

Volumn 4689 I, Issue , 2002, Pages 313-335

  Dixson, Ronald ^a,b   Guerry, Angela ^b   Bennett, Marylyn ^b   Vorburger, Theodore ^a   Postek, Michael ^a  

^a NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

^b SEMATECH   (United States)

Author keywords

AFM; CD; Height; Linewidth; Metrology; Pitch; Reference measurement system

Indexed keywords

ATOMIC FORCE MICROSCOPY; BENCHMARKING; CALIBRATION; MEASUREMENTS; STANDARDS; TOOLS;

CRITICAL DIMENSIONS (CD); REFERENCE MEASUREMENT SYSTEMS (RMS);

SEMICONDUCTOR DEVICE MANUFACTURE;

EID: 0036028584     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.473471     Document Type: Article

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