A comprehensive test of optical scatterometry readiness for 65 nm technology production

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6152 I, Issue , 2006, Pages

  Ukraintsev, Vladimir A ^a  

^a TEXAS INSTRUMENTS   (United States)

Author keywords

AFM; Bias variation; Critical dimension; Fleet precision; Scatterometry; TMU

Indexed keywords

ATOMIC FORCE MICROSCOPY; MATHEMATICAL MODELS; MEASUREMENT THEORY; OPTICAL RESOLVING POWER; OPTICAL SYSTEMS; PRECISION ENGINEERING;

BIAS VARIATION; CRITICAL DIMENSION (CD); FLEET PRECISION; SCATTEROMETRY; TMU;

LIGHT SCATTERING;

EID: 33745629315     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.657649     Document Type: Conference Paper

References (16)

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11. Microsoft Excel SLOPE function was used to evaluate linearity (slope) of OS data.
12. Microsoft Excel CORREL function was used to calculate correlation between of OS and reference (AFM) data.
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