Progress on implementation of a CD-AFM-based reference measurement system

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6152 I, Issue , 2006, Pages

  Orji, Ndubuisi G ^a,b   Martinez, Angela ^c   Dixson, Ronald G ^a   Allgair, John ^b,d  

^a NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

^b SEMATECH   (United States)

^c ATDF Inc   (United States)

^d FREESCALE SEMICONDUCTOR INC   (United States)

Author keywords

CD AFM; Higher order tip effects; Linewidth; Metrology; Reference measurement system; Traceability

Indexed keywords

CD-AFM; HIGHER ORDER TIP EFFECTS; LINEWIDTH; REFERENCE MEASUREMENT SYSTEM; TRACEABILITY;

ATOMIC FORCE MICROSCOPY; CALIBRATION; INSPECTION; PRECISION ENGINEERING; SEMICONDUCTOR MATERIALS; STANDARDS;

METRIC SYSTEM;

EID: 33745614592     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.653287     Document Type: Conference Paper

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