Effects of negative low self-bias on hydrogenated amorphous carbon films deposited by PECVD technique

Diamond and Related Materials

Volumn 12, Issue 3-7, 2003, Pages 988-992

  Maitre N ^a   Girardeau, Th ^a   Camelio, S ^a   Barranco, A ^a   Vouagner, D ^b   Breelle, E ^c  

^a UMR6630   (France)

^b UNIVERSITÉ LYON 1   (France)

^c SORBONNE UNIVERSITÉ   (France)

Author keywords

Amorphous hydrogenated carbon; Plasma CVD; Stress; Surface energy

Indexed keywords

AMORPHOUS MATERIALS; HYDROGENATION; INTERFACIAL ENERGY; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; POROSITY;

X-RAY REFLECTIVITY;

CARBON;

DIAMOND;

EID: 0038183990     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0925-9635(02)00280-7     Document Type: Article

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