Pressure and power dependence of self-bias, sheath thickness, and deposition rate in confined methane plasmas at 13.56 MHz

Applied Physics Letters

Volumn 69, Issue 6, 1996, Pages 752-754

  Hytry, R ^a   Boutard Gabillet, D ^a  

^a CEA SACLAY   (France)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 5844386418     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.117880     Document Type: Article

References (18)

1. J. C. Angus, P. Koidl, and S. Domitz, in Plasma Deposited Thin Films, edited by J. Mort and F. Jansen (CRC, Boca Raton, FL, 1986), p. 89.
2. Y. Catherine, Mater. Sci. Forum 52&53, 175 (1989).
3. D. Boutard and W. Möller, J. Mater. Res. 5, 2451 (1990).
4. D. Boutard and W. Möller, Surf. Coat. Technol. 45, 353 (1991).
5. B. N. Chapman, Glow Discharge Processes (Wiley, New York, 1980).
6. H. R. Koenig and L. I. Maissel, IBM J. Res. Dev. 14, 168 (1970).
7. J. H. Keller and W. B. Pennebaker, IBM J. Res. Dev. 23, 3 (1979).
8. W. B. Pennebaker, IBM J. Res. Dev. 23, 16 (1979).
9. C. B. Zarowin, J. Vac. Sci. Technol. A 2, 1537 (1984).
10. Y. Catherine and P. Couderc, Thin Solid Films 144, 265 (1986).
11. J. Robertson, Surf. Coat. Technol. 50, 185 (1992).
12. N. Mutsukura, K. Kobayashi, and Y. Machi, J. Appl. Phys. 66, 4688 (1989).
13. N. Mutsukura, Y. Fukasawa, Y. Machi, and T. Kobuta, J. Vac. Sci. Technol. A 12, 3126 (1994).
14. J. W. Coburn and E. Kay, J. Appl. Phys. 43, 4965 (1972).
15. K. Tachibana, M. Nishida, H. Harima, and Y. Urano, J. Phys. D Appl. Phys. 17, 1727 (1984).
16. A. V. Keudell, W. Möller, and R. Hytry, Appl. Phys. Lett. 62, 937 (1993).
17. W. Möller, Appl. Phys. A 56, 527 (1993).
18. A. V. Keudell and W. Möller, J. Appl. Phys. 75, 7718 (1994).