Proton beam micromachined buried microchannels in negative tone resist materials

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 260, Issue 1, 2007, Pages 414-418

  Rajta, I ^a   Chatzichristidi, M ^b   Baradacs E ^c   Cserhati C ^c   Raptis, I ^b   Manoli, K ^b   Valamontes, E S ^d,e  

^a INSTITUTE OF EXPERIMENTAL MEDICINE   (Hungary)

^b INSTITUTE OF NANOSCIENCE AND NANOTECHNOLOGY   (Greece)

^c UNIVERSITY OF DEBRECEN   (Hungary)

^d UNIVERSITY OF PELOPONNESE   (Greece)

^e UNIVERSITY OF WEST ATTICA   (Greece)

Author keywords

Chemically amplified resist; High aspect ratio technologies; Microchannel; Proton beam writing (PBW); Tilted structure

Indexed keywords

ASPECT RATIO; GONIOMETERS; MICROMACHINING; PROTON BEAMS; SURFACE STRUCTURE;

CHEMICALLY AMPLIFIED RESISTS; PROTON BEAM WRITING (PBW); TILTED STRUCTURES;

MICROCHANNELS;

EID: 34250011753     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.nimb.2007.02.055     Document Type: Article

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