Fabrication of photonic crystals by deep x-ray lithography

Applied Physics Letters

Volumn 71, Issue 11, 1997, Pages 1441-1443

  Feiertag, G ^a   Ehrfeld, W ^a   Freimuth, H ^a   Kolle, H ^a   Lehr, H ^a   Schmidt, M ^a   Sigalas, M M ^b   Soukoulis, C M ^b   Kiriakidis, G ^c   Pedersen, T ^c   Kuhl, J ^d   Koenig, W ^d  

^a INSTITUT FÜR MIKROTECHNIK MAINZ GMBH   (Germany)

^b IOWA STATE UNIVERSITY   (United States)

^c INSTITUTE OF COMPUTER SCIENCE   (Greece)

^d MAX PLANCK INSTITUT FÜR FESTKÖRPERFORSCHUNG   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

BAND STRUCTURE; FABRICATION; PERMITTIVITY; PHOTONS; POLYMETHYL METHACRYLATES; PYROLYSIS; SYNCHROTRON RADIATION; THREE DIMENSIONAL;

PHOTONIC CRYSTALS; PRECERAMIC POLYMER; TRANSFER MATRIX METHOD;

X RAY LITHOGRAPHY;

EID: 0031572019     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.120431     Document Type: Article

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