Layer-by-layer UV micromachining methodology of epoxy resist embedded microchannels

Microelectronic Engineering

Volumn 83, Issue 4-9 SPEC. ISS., 2006, Pages 1298-1301

  Kitsara, M ^a,b   Chatzichristidi, M ^a   Niakoula, D ^a   Goustouridis, D ^a   Beltsios, K ^b   Argitis, P ^a   Raptis, I ^a  

^a INSTITUTE OF MICROELECTRONICS   (Greece)

^b UNIVERSITY OF IOANNINA   (Greece)

Author keywords

Embedded microchannels; Epoxy resist; UV lithography

Indexed keywords

EMBEDDED MICROCHANNELS; EPOXY RESIST; PHOTO ACID GENERATOR (PAG);

FLUIDIC DEVICES; MICROMACHINING; MOLECULAR WEIGHT; OPTIMIZATION; PHOTORESISTORS; ULTRAVIOLET DEVICES;

MICROELECTRONICS;

EID: 33646489834     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2006.01.157     Document Type: Article

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