Partially hydrogenated poly(vinyl phenol) based photoresist for near UV, high aspect ratio micromachining

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 20, Issue 6, 2002, Pages 2968-2972

  Chatzichristidi, M ^a   Raptis, I ^a   Argitis, P ^a   Everett, J ^b  

^a INSTITUTE OF MICROELECTRONICS   (Greece)

^b DOW CHEMICAL COMPANY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ONIUM SALT PHOTOACID GENERATORS; POLYVINYL PHENOL; STANDARD AQUEOUS BASE SOLUTION;

CROSSLINKING; HYDROGENATION; HYDROPHOBICITY; LITHOGRAPHY; MICROMACHINING; SOLUTIONS; VINYL RESINS;

PHOTORESISTS;

EID: 0036883186     PISSN: 0734211X     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1521741     Document Type: Article

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