Surface loss probabilities of the dominant neutral precursors for film growth in methane and acetylene discharges

Applied Physics Letters

Volumn 74, Issue 25, 1999, Pages 3800-3802

  Hopf, C ^a   Letourneur, K ^b   Jacob, W ^a   Schwarz Selinger, T ^a   Von Keudell, A ^a  

^a MAX PLANCK INSTITUT FÜR PLASMAPHYSIK   (Germany)

^b EINDHOVEN UNIVERSITY OF TECHNOLOGY   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001704616     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.124184     Document Type: Article

References (16)

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