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Surface and Coatings Technology

Volumn 200, Issue 1-4 SPEC. ISS., 2005, Pages 458-462

Macroscopic plasma-chemical approach to plasma polymerization of HMDSO and CH4

(3) Hegemann, Dirk a Schutz U a Fischer, A a

a SWISS FEDERAL LABORATORIES FOR MATERIALS SCIENCE AND TECHNOLOGY (Switzerland)

Author keywords

Activation energy; Deposition rate; Similarity parameter; Up scaling

Indexed keywords

ACTIVATION ENERGY; CHEMICAL REACTORS; DEPOSITION; FREE RADICAL POLYMERIZATION; METHANE; SILICON COMPOUNDS;

HEXAMETHYLDISILOXANE; MACROSCOPIC PLASMA-CHEMICAL APPROACH; MASS DEPOSITION RATE; SIMILARITY PARAMETER; UP-SCALING;

PLASMA POLYMERIZATION;

COATING;

EID: 24644446907 PISSN: 02578972 EISSN: None Source Type: Journal
DOI: 10.1016/j.surfcoat.2005.02.194 Document Type: Article

Times cited : (29)

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