Acidic acrylic polymers for nanoimprint lithography on flexible substrates

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 23, Issue 6, 2005, Pages 2518-2521

  Liao, Wen Chang ^a   Hsu, Steve Lien Chung ^a  

^a NATIONAL CHENG KUNG UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

ACRYLICS; COPOLYMERIZATION; FREE RADICAL POLYMERIZATION; LITHOGRAPHY; NANOSTRUCTURED MATERIALS; PLASTICS; REACTIVE ION ETCHING;

ACRYLIC POLYMERS; HIGH-DENSITY LINE; NANOIMPRINT LITHOGRAPHY; SPACE PATTERNS;

POLYMERS;

EID: 29044437119     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2131874     Document Type: Article

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