Hollow laser self-confined plasma for extreme ultraviolet lithography and other applications

Laser and Particle Beams

Volumn 25, Issue 1, 2007, Pages 143-154

  Sizyuk, V ^a   Hassanein, A ^a   Sizyuk, T ^a  

^a ARGONNE NATIONAL LABORATORY   (United States)

Author keywords

Extreme ultraviolet; Hollow laser; Laser plasmas; Plasma device modeling

Indexed keywords

EXTREME ULTRAVIOLET; HOLLOW LASERS; LASER PLASMAS; PLASMA DEVICE MODELING;

COMPUTER SIMULATION; HEAT CONDUCTION; LASER BEAMS; LIGHT SOURCES; LITHOGRAPHY; MATHEMATICAL MODELS;

LASER PRODUCED PLASMAS;

EID: 33947430577     PISSN: 02630346     EISSN: 1469803X     Source Type: Journal    
DOI: 10.1017/S026303460707019X     Document Type: Article

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