HEIGHTS initial simulation of discharge produced plasma hydrodynamics and radiation transport for extreme ultraviolet lithography

Journal of Microlithography, Microfabrication and Microsystems

Volumn 3, Issue 1, 2004, Pages 130-138

  Hassanein, A ^a   Sizyuk, V ^a   Tolkach, V ^a   Morozov, V ^a   Rice, B ^b  

^a ARGONNE NATIONAL LABORATORY   (United States)

^b INTEL CORPORATION   (United States)

Author keywords

Discharge produced plasma; HEIGHTS EUV; Magnetohydrodynamics; Numerical simulation; Radiation transport

Indexed keywords

DISCHARGE-PRODUCED PLASMA; HEIGHTS-EUV; RADIATION FLUX; RADIATION TRANSPORT;

COMPUTER SIMULATION; DENSITY (OPTICAL); ELECTRODES; IONIZATION; MAGNETOHYDRODYNAMICS; MATHEMATICAL MODELS; PLASMAS; RADIATION; ULTRAVIOLET RADIATION;

LITHOGRAPHY;

EID: 2542490321     PISSN: 15371646     EISSN: None     Source Type: Journal    
DOI: 10.1117/1.1631445     Document Type: Article

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