Simulation and optimization of DPP hydrodynamics and radiation transport for EUV lithography devices

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5374, Issue PART 1, 2004, Pages 413-422

  Hassanein, A ^a   Sizyuk, V ^a   Tolkach, V ^a   Morozov, V ^a   Sizyuk, T ^a   Rice, B ^b   Bakshi, V ^c  

^a ARGONNE NATIONAL LABORATORY   (United States)

^b INTEL CORPORATION   (United States)

^c SEMATECH   (United States)

Author keywords

Discharge produced plasma; HEIGHTS EUV; MHD; Numerical simulation; Radiation transport

Indexed keywords

CATHODES; COMPUTER SIMULATION; ENERGY DISSIPATION; MAGNETOHYDRODYNAMICS; MATHEMATICAL MODELS; PLASMAS;

DISCHARGE-PRODUCED PLASMA (DPP); HEIGHTS-EUV; LITHOGRAPHY DEVICES; RADIATION TRANSPORT;

LITHOGRAPHY;

EID: 3843094858     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.534269     Document Type: Conference Paper

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