Debris mitigation in a laser-produced tin plume using a magnetic field

Journal of Applied Physics

Volumn 98, Issue 3, 2005, Pages

  Harilal, S S ^a   O'Shay, Beau ^a   Tillack, Mark S ^a  

^a UNIVERSITY OF CALIFORNIA SAN DIEGO   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DEBRIS MITIGATION; GARNET LASERS; TIN PLUMES; ULTRAVIOLET SOURCES;

DEBRIS; EMISSION SPECTROSCOPY; GARNETS; KINETIC ENERGY; LIGHT EMISSION; LITHOGRAPHY; MAGNETIC FIELDS; NEODYMIUM LASERS; THERMAL PLUMES; ULTRAVIOLET RADIATION;

TIN;

EID: 23944457611     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1999851     Document Type: Article

References (19)

1. B. Marx, Laser Focus World 39, 34 (2003).
2. International Sematech EUV Source workshop, Texas, 14 October 2002 (unpublished).
3. U. Stamm, J. Phys. D 37, 3244 (2004).
4. A. Cummings, G. O'Sullivan, P. Dunne, E. Sokell, N. Murphy, and J. White, J. Phys. D 38, 604 (2005).
5. S. J. Haney, K. W. Berger, G. D. Kubiak, P. D. Rockett, and J. Hunter, Appl. Opt. 32, 6934 (1993).
6. M. Richardson, C. S. Koay, K. Takenoshita, C. Keyser, and M. Al-Rabban, J. Vac. Sci. Technol. B 22, 785 (2004).
7. F. Flora, L. Mezi, C. E. Zheng, and F. Bonfigli, Europhys. Lett. 56, 676 (2001).
8. S. S. Harilal, M. S. Tillack, B. O'Shay, C. V. Bindhu, and F. Najmabadi, Phys. Rev. E 69, 026413 (2004).
9. D. K. Bhadra, Phys. Fluids 11, 234 (1968).
10. B. H. Ripin, J. D. Huba, E. A. McLean, C. K. Manka, T. Peyser, H. R. Burris, and J. Grun, Phys. Fluids B 5, 3491 (1993).
11. Y. Y. Tsui, H. Minami, D. Vick, and R. Fedosejevs, J. Vac. Sci. Technol. A 20, 744 (2002).
12. S. S. Harilal, C. V. Bindhu, M. S. Tillack, F. Najmabadi, and A. C. Gaeris, J. Appl. Phys. 93, 2380 (2003).
13. S. S. Harilal, R. C. Issac, C. V. Bindhu, V. P. N. Nampoori, and C. P. G. Vallabhan, J. Appl. Phys. 80, 3561 (1996).
14. T. J. M. Boyd and J. J. Sanderson, The Physics of Plasmas (Cambridege, New York, 2003).
15. S. S. Harilal, C. V. Bindhu, R. C. Issac, V. P. N. Nampoori, and C. P. G. Vallabhan, J. Appl. Phys. 82, 2140 (1997).
16. H. R. Griem, Principles of Plasma Spectroscopy (Cambridge, New York, 1997).
17. M. Richardson, Micro-droplet Laser-Plasma Sources for EUV Lithography UCSD Seminar, La Jolla, 24 January 2005 (unpublished).
18. D. L. Pappas, K. L. Saenger, J. J. Cuomo, and R. W. Dreyfus, J. Appl. Phys. 72, 3966 (1992).
19. S. Amoruso, M. Armenante, R. Bruzzese, N. Spinelli, R. Velotta, and X. Wang, Appl. Phys. Lett. 75, 7 (1999).