Numerical simulation of laser-produced plasma devices for EUV lithography using the heights integrated model

Numerical Heat Transfer; Part A: Applications

Volumn 49, Issue 3, 2006, Pages 215-236

  Sizyuk, V ^a   Hassanein, A ^a   Morozov, V ^a   Tolkach, V ^a   Sizyuk, T ^a   Rice, B ^b  

^a ARGONNE NATIONAL LABORATORY   (United States)

^b INTEL CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; DIFFUSION; LITHOGRAPHY; MAGNETIC FIELDS; MAGNETOHYDRODYNAMICS; MONTE CARLO METHODS; PHOTONS; PLASMA DEVICES; ULTRAVIOLET RADIATION; XENON;

EUV LITHOGRAPHY; LPP DEVICES; MAGNETIC COMPRESSION;

LASER PRODUCED PLASMAS;

EID: 30344457058     PISSN: 10407782     EISSN: 15210634     Source Type: Journal    
DOI: 10.1080/10407780500324996     Document Type: Article

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