FTIR and ellipsometry characterization of ultra-thin ALD TaN films

Materials Chemistry and Physics

Volumn 101, Issue 2-3, 2007, Pages 269-275

  Wu, Y Y ^a,b   Eizenberg, M ^b  

^a HARBIN INSTITUTE OF TECHNOLOGY   (China)

^b TECHNION ISRAEL INSTITUTE OF TECHNOLOGY   (Israel)

Author keywords

Atomic layer deposition; Ellipsometry; FTIR; Tantalum nitride

Indexed keywords

ANNEALING; ELLIPSOMETRY; FOURIER TRANSFORM INFRARED SPECTROSCOPY; OPTICAL FILMS; SINGLE CRYSTALS; SPECTROSCOPIC ANALYSIS; TANTALUM COMPOUNDS;

ATOMIC LAYER-DEPOSITION (ALD); TANTALUM NITRIDE;

ULTRATHIN FILMS;

EID: 33846409475     PISSN: 02540584     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.matchemphys.2006.05.002     Document Type: Article

References (43)

1. Chao J.S.H., Kang H., Wong S.S., and Shacham-Diamand Y. MRS Bull. 18 (1993) 31
2. Wittmer M. Appl. Phys. Lett. 36 (1980) 456
3. Olowolafe J.O., Mogab C.J., Gregory R.B., and Kottke M. J. Appl. Phys. 72 (1992) 4099
4. Yeo Y.-C., Ranade P., King T.-J., and Hu C. IEEE Electron. Device Lett. 23 6 (2002) 342
5. Yeo Y.-C., Ranade P., Lu Q., Lin R., King T.-J., and Hu C. VLSI Tech. Dig. June (2001) 49
6. Pan J., Woo C., Yang C.-Y., Bhandary U., Guggilla S., Krishna N., Chung H., Hui A., Yu B., Xiang Q., and Lin M.-R. IEEE Electron. Device Lett. 24 5 (2003) 304
7. Yu H.Y., Kang J.F., Chen J.D., Ren C., Hou Y.T., Whang S.J., Li M.-F., Chan D.S.H., Bera K.L., Tung C.H., Du A., and Kwong D.-L. IEDM (2003)
8. Yu H.Y., Lim H.F., Chen J.H., Li M.F., Zhu C., Tung C.H., Du A.Y., Wang W.D., Chi D.Z., and Kwong D.-L. IEEE Electron. Device Lett. 24 4 (2003) 230
9. Suh Y.-S., Heuss G., Zhong H., Hong S.-N., and Misra V. Symposium on VLSI Technology, Digest of Technical Papers (2001) 47
10. Wu Y.Y., Kohn A., and Eizenberg M. J. Appl. Phys. 95 (2004) 6167
11. Klaus J.W., Ferro S.J., and George S.M. J. Electrochem. Soc. 147 (2000) 1175
12. Ott A.W., Klaus J.M., Johnson J.M., and George S.M. Thin Solid Films 292 (1997) 135
13. George S.M., Sneh O., Dillon A.C., Wise M.L., Ott A.W., Okada L.A., and Way J.D. Appl. Surf. Sci. 82/83 (1994) 460
14. Sneh O., Wise M.L., Ott A.W., Okada L.A., and George S.M. Surf. Sci. 334 (1995) 135
15. Lakomaa E.-L., Root A., and Suntola T. Appl. Surf. Sci. 107 (1996) 107
16. Puurunen R.L., Root A., Sarv P., Haukka S., Iiskola E.I., Lindblad M., and Krause A.O.I. Appl. Surf. Sci. 165 (2000) 193
17. Kobayashi N., and Horikoshi Y. Jpn. J. Appl. Phys. 28 (1989) L1880
18. Puurunen R.L., Root A., Haukka S., Iiskola E.I., Lindblad M., and Krause A.O.I. J. Phys. Chem. B104 (2000) 6599
19. Palacio C., Sanz J.M., and Martinez-Duart J.M. Thin Solid Films 124 (1985) 243
20. Holloway P.H., and Nelson G.C. J. Vac. Sci. Technol. 16 2 (1979) 793
21. Klaus J.W., Ferro S.J., and George S.M. Thin Solid Films 360 (2000) 145
22. Newman R.C., and Smith R.S. Phys. Lett. A 24 (1967) 671
23. Urban M.W. Vibrational Spectroscopy of Molecules and Macromolecules on Surface (1993), John Wiley & Sons, Inc., USA
24. White R.L., and Nair A. Appl. Spectrosc. 44 1 (1990) 89
25. Szymanski H.A. IR Theory & Practice of Infrared Spectroscopy (1964), Plenum Press, New York
26. Hadjiivanov K. Appl. Surf. Sci. 135 (1998) 331
27. Lanford W.A., and Rand M.J. J. Appl. Phys. 49 (1978) 2473
28. Kim Y.H., Lee S.K., and Kim H.J. J. Vac. Sci. Technol. A 18 (2000) 1216
29. Cui H., Bhat I.B., Murarka S.P., Lu H.Q., Li W., Hsia W.J., and Carabay W. J. Electrochem. Soc. 147 (2000) 3816
30. Koh Y.W., Loh K.P., Rong L., Wee A.T.S., Huang L., and Sudijono J. J. Appl. Phys. 93 2 (2003) 1241
31. Banerji N., Serra J., Serra C., Chiussi S., Lusquinos F., Redondas X., Leon B., and Perez-Amor M. Surf. Coat. Technol. 100-101 (1998) 393
32. Ono H., and Koyanagi K. Appl. Phys. Lett. 77 10 (2000) 1431
33. Nakamoto K. Infrared & Raman Spectra of Inorganic & Coordination Compounds. fourth ed. (1986), Wiley/Interscience, New York (Section III-1)
34. Zhang J.-Y., Fang Q., and Boyd I.W. Appl. Surf. Sci. 138-139 (1999) 320
35. Boyd I.W., and Zhang J.-Y. Microelectron. Reliability 40 (2000) 649
36. Sacconi L., and Sabatini A. J. Inorg. Nucl. Chem. 25 (1963) 1389
37. Jong Ch.-A., Gan J.-Y., and Chin T.-S. Jpn. J. Appl. Phys. 41 (2002) 5367
38. Dillon A.C., Gupta P., Robinson M.B., Bracker A.S., and George S.M. J. Electron. Spectrosc. Relat. Phenom. 54-55 (1990) 1085
39. Wong H., Yang B.L., and Cheng Y.C. Appl. Surf. Sci. 72 1 (1993) 49
40. Coyne H.J., and Tauber R.N. J. Appl. Phys. 39 12 (1968) 5585
41. Kukli K., Aarik J., Aidla A., Kohan O., Uustare T., and Sammelcelg V. Thin Solid Films 260 (1995) 135
42. Schonberg N. Acta Scand. 8 (1954) 240
43. Jong Ch.-A., and Chin T.S. Mater. Chem. Phys. 74 (2002) 201