Comparison of modifications induced by ArF excimer laser irradiation on silicon nitride films deposited by different LCVD methods

Surface and Coatings Technology

Volumn 100-101, Issue 1-3, 1998, Pages 393-397

  Banerji, N ^a   Serra, J ^a   Serra, C ^a   Chiussi, S ^a   Lusquinos F ^a   Redondas, X ^a   Leon B ^a   Perez Amor M ^a  

^a UNIVERSITY OF VIGO   (Spain)

Author keywords

ArF laser; Irradiation; LCVD; Silicon nitride

Indexed keywords

AMMONIA; CHEMICAL VAPOR DEPOSITION; EXCIMER LASERS; HYDROGEN BONDS; HYDROGENATION; MORPHOLOGY; OXIDATION RESISTANCE; REFRACTIVE INDEX; SILANES; SILICON NITRIDE; SURFACE TREATMENT;

LASER ASSISTED CHEMICAL VAPOR DEPOSITION (LCVD);

AMORPHOUS FILMS;

EID: 0032026754     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(97)00655-5     Document Type: Article

References (17)

1. K. Shimizu, K. Nakamura, M. Higasimoto, O. Sugiura, M. Matsumura, Jpn. J. Appl. Phys. 32 (1993) 452.
2. V.I. Belyi et al., Silicon Nitride in Electronics, Elsevier, Amsterdam, 1988.
3. K. Nakamae, K. Kurosawa, Y. Takigawa, W. Sasaki, Y. Izawa, M. Okuda, Jpn. J. Appl. Phys. 34 (1995) L1482.
4. Y. Takigawa, W. Sasaki, Y. Kato, M. Okuda, Nucl. Instrum. Meth. Phys. Res. B 116 (1996) 211.
5. K. Nakamae, K. Kurosawa, H. Ohmukai, M. Katto, M. Okuda, W. Sasaki, S. Nozawa, T. Igarashi, Nucl. Instrum. Meth. B 91 (1994) 659.
6. J. Serra, E.G. Parada, P. Gonzalez, D. Fernandez, S. Chiussi, J. Pou, B. Leon, M. Pérez -Amor, Surf. Coat. Technol. 80 (1996) 211.
7. J. Serra, T. Szörényi, D. Fernandez, P. González, E. Garcia, J. Pou, B. León, M. Pérez-Amor, J. Non-Cryst. Solids 187 (1995) 35.
8. E.G. Parada, P. González, J. Serra, B. León, M. Pérez-Amor, J. Flicstein, R.A.B. Devine, Appl. Surf. Sci. 86 (1995) 294.
9. I. Herman, Chem. Rev. 89 (1989) 1323.
10. E.T.S. Pan, J.H. Flint, D. Adler, J.S. Haggerly, J. Appl. Phys. 61 (9) (1987) 4535.
11. J.M. Jasinski, B.S. Mayerson, T.N. Nguyen, J. Appl. Phys. 61 (1987) 431.
12. R. Henda, L. Laanab, E. Scheid, R. Fourmeaux, Jpn. J. Appl. Phys. 34 (1995) 437.
13. G. Lucovsky, D.V. Tsu, J. Vac. Sci. Technol. A 5 (4) (1987) 2231.
14. C.T. Kirk, Phys. Rev. B 38 (2) (1988) 1255.
15. H. Watanabe, H. Miki, S. Sugai, K. Kawasaki, T. Kioka, Jpn. J. Appl. Phys. 33 (1994) 4491.
16. D. Bäuerle, Chemical Processing with Lasers, Springer, Berlin, 1986.
17. F.R. Aussenegg, A. Leitner, M.E. Lippitsch, Surface Studies with Lasers, Springer, Berlin, 1983.