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Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 41, Issue 8, 2002, Pages 5367-5371

Microstructure and thermal diffusivity investigations of RF-sputtered tantalum nitride films

(3) Jong, Chao An a Gan, Jon Yiew a Chin, Tsung Shune a

a NATIONAL TSING HUA UNIVERSITY (Taiwan)

Author keywords

FTIR; Microstructure; Tantalum nitride films; Thermal diffusivity; XPS

Indexed keywords

CRYSTAL MICROSTRUCTURE; FOURIER TRANSFORM INFRARED SPECTROSCOPY; MAGNETRON SPUTTERING; NANOSTRUCTURED MATERIALS; TANTALUM COMPOUNDS; THERMAL DIFFUSION; X RAY PHOTOELECTRON SPECTROSCOPY;

NITROGENATION;

AMORPHOUS FILMS;

EID: 0036697505 PISSN: 00214922 EISSN: None Source Type: Journal
DOI: 10.1143/jjap.41.5367 Document Type: Article

Times cited : (5)

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