Surface reactions in Al 2 O 3 growth from trimethylaluminium and water by atomic layer epitaxy

Applied Surface Science

Volumn 107, Issue , 1996, Pages 107-115

  Lakomaa, E L ^a   Root, A ^b   Suntola, T ^a  

^a Microchemistry Ltd   (Finland)

^b Neste Oil Oyj   (Finland)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMISORPTION; FILM GROWTH; FOURIER TRANSFORM INFRARED SPECTROSCOPY; NUCLEAR MAGNETIC RESONANCE SPECTROSCOPY; POROUS MATERIALS; SATURATION (MATERIALS COMPOSITION); SILICA; SURFACE PHENOMENA; SURFACE STRUCTURE; THERMAL EFFECTS;

ATOMIC LAYER EPITAXY; TRIMETHYLALUMINUM;

ALUMINA;

EID: 0030566291     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(96)00513-2     Document Type: Article

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