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Volumn 353, Issue 2, 2007, Pages 136-142
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Effect of N2/CH4 flow ratio on microstructure and composition of hydrogenated carbon nitride films prepared by a dual DC-RF plasma system
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Author keywords
Chemical vapor deposition; Films and coatings; FTIR measurements; Hardness; Indentation; Microindentation; Microstructure; Plasma deposition; Vapor phase deposition; XPS
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Indexed keywords
CARBON NITRIDE;
FOURIER TRANSFORM INFRARED SPECTROSCOPY;
HARDNESS;
HYDROGENATION;
INDENTATION;
MICROSTRUCTURE;
PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;
THIN FILMS;
X RAY PHOTOELECTRON SPECTROSCOPY;
FILMS AND COATINGS;
MICROINDENTATION;
PLASMA DEPOSITION;
VAPOR PHASE DEPOSITION;
NITROGEN COMPOUNDS;
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EID: 33845696827
PISSN: 00223093
EISSN: None
Source Type: Journal
DOI: 10.1016/j.jnoncrysol.2006.10.008 Document Type: Article |
Times cited : (23)
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References (42)
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