Structural and mechanical properties of CN(x) thin films prepared by magnetron sputtering

Diamond and Related Materials

Volumn 9, Issue 3-6, 2000, Pages 566-572

  Kurt, R ^a   Sanjines, R ^a   Karimi, A ^a   Levy F ^a  

^a EPFL   (Switzerland)

Author keywords

Carbon nitride; Infrared spectrocopy; Nanoindentation; Raman spectroscopy

Indexed keywords

AMORPHOUS MATERIALS; ARGON; CHEMICAL BONDS; COATINGS; ELASTIC MODULI; FILM GROWTH; INFRARED SPECTROSCOPY; MAGNETRON SPUTTERING; NITROGEN; PARTIAL PRESSURE; SILICON; THIN FILMS;

CARBON NITRIDE; NANOINDENTATION;

CARBON INORGANIC COMPOUNDS;

CARBON NITRIDE; MECHANICAL PROPERTY; SPUTTERING; STRUCTURAL ANALYSIS;

EID: 0034047266     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0925-9635(00)00212-0     Document Type: Conference Paper

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