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Volumn 351, Issue 49-51, 2005, Pages 3671-3676
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Effect of deposition pressure on microstructure and properties of hydrogenated carbon nitride films prepared by DC-RF-PECVD
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Author keywords
[No Author keywords available]
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Indexed keywords
CARBON NITRIDE;
CHEMICAL BONDS;
FOURIER TRANSFORM INFRARED SPECTROSCOPY;
GROWTH (MATERIALS);
HYDROGENATION;
MICROSTRUCTURE;
PHASE COMPOSITION;
PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;
SEMICONDUCTING SILICON;
X RAY PHOTOELECTRON SPECTROSCOPY;
BONDING STRUCTURES;
DEPOSITION PRESSURE;
GROWTH RATES;
THIN FILMS;
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EID: 27944480044
PISSN: 00223093
EISSN: None
Source Type: Journal
DOI: 10.1016/j.jnoncrysol.2005.10.013 Document Type: Article |
Times cited : (23)
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References (37)
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