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Volumn 351, Issue 49-51, 2005, Pages 3671-3676

Effect of deposition pressure on microstructure and properties of hydrogenated carbon nitride films prepared by DC-RF-PECVD

Author keywords

[No Author keywords available]

Indexed keywords

CARBON NITRIDE; CHEMICAL BONDS; FOURIER TRANSFORM INFRARED SPECTROSCOPY; GROWTH (MATERIALS); HYDROGENATION; MICROSTRUCTURE; PHASE COMPOSITION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SEMICONDUCTING SILICON; X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 27944480044     PISSN: 00223093     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jnoncrysol.2005.10.013     Document Type: Article
Times cited : (23)

References (37)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.