Mechanical properties of boron nitride thin films obtained by RF-PECVD at low temperatures

Thin Solid Films

Volumn 373, Issue 1-2, 2000, Pages 273-276

  Vilcarromero, J ^a   Carreno M N P ^a   Pereyra, I ^a  

^a UNIVERSITY OF SÃO PAULO   (Brazil)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS FILMS; BORON COMPOUNDS; HARDNESS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; RAMAN SPECTROSCOPY; STOICHIOMETRY; STRESS ANALYSIS; SUBSTRATES; THIN FILMS;

BORON NITRIDES;

SEMICONDUCTING FILMS;

EID: 0034262928     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(00)01096-8     Document Type: Article

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