Effect of nitrogen content on the microstructure and mechanical properties of CNx thin films

Physica B: Condensed Matter

Volumn 337, Issue 1-4, 2003, Pages 318-322

  Alba de Sanchez N ^a   Carrasco, C ^b   Prieto, P ^c  

^a Gruppo Cie e Ing de Materiales   (Colombia)

^b UNIVERSITY OF CONCEPCIÓN   (Chile)

^c UNIVERSIDAD DEL VALLE   (Colombia)

Author keywords

Atomic force microscopy; Carbon nitrides; Nano indentation; X ray photoelectron spectroscopy

Indexed keywords

ATOMIC FORCE MICROSCOPY; CARBON NITRIDE; CRYSTAL MICROSTRUCTURE; ELASTIC MODULI; ELECTRIC POTENTIAL; FRICTION; HARDNESS; MAGNETRON SPUTTERING; MORPHOLOGY; X RAY PHOTOELECTRON SPECTROSCOPY;

DEPOSITION PARAMETERS;

THIN FILMS;

EID: 0041826807     PISSN: 09214526     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0921-4526(03)00423-X     Document Type: Article

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