XPS, XANES and ToF-SIMS characterization of reactively magnetron-sputtered carbon nitride films

Surface and Interface Analysis

Volumn 25, Issue 5, 1997, Pages 315-323

  Lopez, S ^a   Dunlop, H M ^a   Benmalek, M ^a   Tourillon, G ^b   Wong, M S ^c   Sproul, W D ^c  

^a ALCAN INTERNATIONAL LIMITED   (Canada)

^b UNIVERSITÉ PARIS SACLAY   (France)

^c NORTHWESTERN UNIVERSITY   (United States)

Author keywords

AES; Carbon nitride; Hybridization; Magnetron sputtered film; PVD; ToF SIMS; XANES; XPS

Indexed keywords

ATOMS; AUGER ELECTRON SPECTROSCOPY; CARBON; CHARACTERIZATION; MAGNETRON SPUTTERING; NITROGEN; SECONDARY ION MASS SPECTROMETRY; X RAY PHOTOELECTRON SPECTROSCOPY;

CARBON NITRIDE FILM; PLASMA IONIZATION; REACTIVE MAGNETRON SPUTTERING; X RAY ADSORPTION NEAR EDGE STRUCTURE;

THIN FILMS;

EID: 0031139890     PISSN: 01422421     EISSN: None     Source Type: Journal    
DOI: 10.1002/(SICI)1096-9918(199705)25:5<315::AID-SIA238>3.0.CO;2-S     Document Type: Article

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