Effect of nitrogen incorporation in CNx thin films deposited by RF magnetron sputtering

Surface and Coatings Technology

Volumn 151-152, Issue , 2002, Pages 175-179

  Mubumbila, N ^a   Tessier, P Y ^a   Angleraud, B ^a   Turban, G ^a  

^a UNIVERSITÉ DE NANTES   (France)

Author keywords

Carbon nitride; Magnetron sputtering; Thin films

Indexed keywords

CARBON NITRIDE; CHEMICAL BONDS; DEPOSITION; FOURIER TRANSFORM INFRARED SPECTROSCOPY; GROWTH KINETICS; MAGNETRON SPUTTERING; NITROGEN; PLASMAS; SCANNING ELECTRON MICROSCOPY; TRANSMISSION ELECTRON MICROSCOPY;

GAS MIXTURE;

THIN FILMS;

CARBON NITRIDE; FILM; NITROGEN; SPUTTERING;

EID: 0036495639     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(01)01569-9     Document Type: Article

References (13)