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Materials Science and Engineering: A

Volumn 408, Issue 1-2, 2005, Pages 297-302

Preparation and characterization of hydrogenated carbon nitride films synthesized by dual DC-RF plasma system

(3) Hao, Junying a,b Xu, Tao a Liu, Weimin a

a LANZHOU INSTITUTE OF CHEMICAL PHYSICS (China)

b UNIVERSITY OF CHINESE ACADEMY OF SCIENCES (China)

Author keywords

Carbon nitride films; Composition; Mechanical properties; PECVD

Indexed keywords

ATOMIC FORCE MICROSCOPY; COMPOSITION; FOURIER TRANSFORM INFRARED SPECTROSCOPY; MECHANICAL PROPERTIES; METHANE; NITROGEN; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; RAMAN SPECTROSCOPY; SILICON; SYNTHESIS (CHEMICAL); TRANSMISSION ELECTRON MICROSCOPY; X RAY PHOTOELECTRON SPECTROSCOPY;

CARBON NITRIDE FILMS; DIRECT CURRENT RADIO FREQUENCY (DC-RF) PLASMA SYSTEM; SILICON SUBSTRATES;

CARBON NITRIDE;

CARBON NITRIDE; FILM;

EID: 27944441741 PISSN: 09215093 EISSN: None Source Type: Journal
DOI: 10.1016/j.msea.2005.08.146 Document Type: Article

Times cited : (18)

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