Nanoparticle formation in low-pressure silane plasmas: Bridging the gap between a-Si:H and μc-Si films

Journal of Non-Crystalline Solids

Volumn 227-230, Issue PART 2, 1998, Pages 871-875

  Roca I Cabarrocas, P ^a   Hamma, S ^a   Sharma, S N ^b   Viera, G ^b   Bertran, E ^b   Costa, J ^c  

^a LABORATOIRE DE PHYSIQUE DES INTERFACES ET DES COUCHES MINCES   (France)

^b UNIVERSITY OF BARCELONA   (Spain)

^c Dept Eng Industrial   (Spain)

Author keywords

Amorphous silicon; Microcrystalline silicon; Polymorphous silicon

Indexed keywords

AMORPHOUS FILMS; CRYSTAL DEFECTS; FILM GROWTH; GLOW DISCHARGES; NANOSTRUCTURED MATERIALS; SEMICONDUCTOR PLASMAS; SILANES;

MICROCRYSTALLINE SILICON; POLYMORPHOUS SILICON;

AMORPHOUS SILICON;

EID: 0032064301     PISSN: 00223093     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-3093(98)00200-2     Document Type: Article

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