Contribution of plasma generated nanocrystals to the growth of microcrystalline silicon thin films

Journal of Non-Crystalline Solids

Volumn 338-340, Issue 1 SPEC. ISS., 2004, Pages 86-90

  Kasouit, S ^a,b   Damon Lacoste, J ^a   Vanderhaghen, R ^a   Roca i Cabarrocas, P ^a  

^a LABORATOIRE DE PHYSIQUE DES INTERFACES ET DES COUCHES MINCES   (France)

^b Unaxis Displays Division France SAS   (France)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; COALESCENCE; DEPOSITION; ELLIPSOMETRY; GROWTH KINETICS; OPTIMIZATION; SILICON; SURFACE CHEMISTRY; THERMOPHORESIS; THIN FILM TRANSISTORS; THIN FILMS;

GROWTH MECHANISMS; GROWTH PROCESSES; IMPEDANCE MEASUREMENT; PLASMA TREATMENTS;

NANOSTRUCTURED MATERIALS;

EID: 2942527301     PISSN: 00223093     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jnoncrysol.2004.02.027     Document Type: Conference Paper

References (16)

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