Polymorphous silicon thin films produced in dusty plasmas: Application to solar cells

Plasma Physics and Controlled Fusion

Volumn 46, Issue 12 B, 2004, Pages

  Cabarrocas, Pere Roca I ^a   Chaabane N ^a   Kharchenko, A V ^a   Tchakarov, S ^a  

^a LABORATOIRE DE PHYSIQUE DES INTERFACES ET DES COUCHES MINCES   (France)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS SILICON; NANOSTRUCTURED MATERIALS; PARAMETER ESTIMATION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; POLYSILICON; PRESSURE EFFECTS; SOLAR CELLS; THIN FILMS;

DUSTY PLASMAS; PLASMA PARAMETERS; POLYMORPHOUS SILICON; WAFER THICKNESS;

PLASMAS;

EID: 12844256980     PISSN: 07413335     EISSN: None     Source Type: Journal    
DOI: 10.1088/0741-3335/46/12B/020     Document Type: Conference Paper

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