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Journal of Applied Physics

Volumn 92, Issue 5, 2002, Pages 2748-2757

Nanocrystalline silicon electron emitter with a high efficiency enhanced by a planarization technique

(3) Nishiguchi, K a Zhao, X b Oda, S a

a TOKYO INSTITUTE OF TECHNOLOGY (Japan)

b TOKYO UNIVERSITY OF SCIENCE (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

COLD ELECTRON EMITTERS; ELECTRODE FILM; ELECTRON EMISSION EFFICIENCY; ELECTRON EMITTERS; GASPHASE; PLANARIZATION PROCESS; PLANARIZATION TECHNIQUE; PLASMA DECOMPOSITION; SPHERICAL SHAPE;

NANOCRYSTALLINE SILICON;

EFFICIENCY;

EID: 0036733964 PISSN: 00218979 EISSN: None Source Type: Journal
DOI: 10.1063/1.1497703 Document Type: Article

Times cited : (102)

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