메뉴 건너뛰기




Volumn 6, Issue 2, 2006, Pages 136-145

Stacked dual-oxide MOS energy band diagram visual representation program (IRW student paper)

Author keywords

Dual oxide; Energy band; High k; MOS; Reliability

Indexed keywords

BAND GAP; DUAL OXIDE; ELECTRON AFFINITY; ENERGY BAND DIAGRAMS;

EID: 33748113122     PISSN: 15304388     EISSN: 15304388     Source Type: Journal    
DOI: 10.1109/TDMR.2006.876971     Document Type: Conference Paper
Times cited : (84)

References (33)
  • 2
    • 0842288136 scopus 로고    scopus 로고
    • Analysis of charge trapping and breakdown mechanism in high-k dielectrics with metal gate electrode using carrier separation
    • W. Y. Loh, B. J. Cho, M. S. Joo, M. F. Li, D. S. Chan, S. Mathew, and D.-L. Kwong, "Analysis of charge trapping and breakdown mechanism in high-k dielectrics with metal gate electrode using carrier separation," in IEDM Tech. Dig., 2003, pp. 38.3.1-38.3.4.
    • (2003) IEDM Tech. Dig.
    • Loh, W.Y.1    Cho, B.J.2    Joo, M.S.3    Li, M.F.4    Chan, D.S.5    Mathew, S.6    Kwong, D.-L.7
  • 3
    • 20444477538 scopus 로고    scopus 로고
    • Special reliability features for Hf-based high-k gate dielectrics
    • Mar.
    • T. P. Ma, H. M. Bu, X. W. Wang, L. Y. Song, W. He, and M. M. Wang, "Special reliability features for Hf-based high-k gate dielectrics," IEEE Trans. Device Mater. Rel., vol. 5, no. 1, pp. 36-44, Mar. 2004.
    • (2004) IEEE Trans. Device Mater. Rel. , vol.5 , Issue.1 , pp. 36-44
    • Ma, T.P.1    Bu, H.M.2    Wang, X.W.3    Song, L.Y.4    He, W.5    Wang, M.M.6
  • 4
    • 14844291414 scopus 로고    scopus 로고
    • Scaling CMOS: Finding the gate stack with the lowest leakage current
    • May
    • T. Kauerauf, B. Govoreanu, R. Degraeve, G. Groeseneken, and H. Maes, "Scaling CMOS: Finding the gate stack with the lowest leakage current," Solid State Electron., vol. 49, no. 5, pp. 695-701, May 2005.
    • (2005) Solid State Electron. , vol.49 , Issue.5 , pp. 695-701
    • Kauerauf, T.1    Govoreanu, B.2    Degraeve, R.3    Groeseneken, G.4    Maes, H.5
  • 5
    • 32344452886 scopus 로고    scopus 로고
    • Electrical characteristics of high-fc dielectric film grown by direct sputtering method
    • Feb.
    • B. Sen, C. K. Sarkar, H. Wong, M. Chan, and C. K. Kok, "Electrical characteristics of high-fc dielectric film grown by direct sputtering method," Solid State Electron., vol. 50, no. 2, pp. 237-240, Feb. 2006.
    • (2006) Solid State Electron. , vol.50 , Issue.2 , pp. 237-240
    • Sen, B.1    Sarkar, C.K.2    Wong, H.3    Chan, M.4    Kok, C.K.5
  • 8
    • 0035872897 scopus 로고    scopus 로고
    • High-k gate dielectrics: Current status and materials properties considerations
    • May
    • G. D. Wilk, R. M. Wallace, and J. M. Anthony, "High-k gate dielectrics: Current status and materials properties considerations," J. Appl. Phys., vol. 89, no. 10, pp. 5243-5275, May 2001.
    • (2001) J. Appl. Phys. , vol.89 , Issue.10 , pp. 5243-5275
    • Wilk, G.D.1    Wallace, R.M.2    Anthony, J.M.3
  • 10
    • 0014926483 scopus 로고
    • The metal-nitride-oxide-silicon (MNOS) transistor-characteristics and applications
    • Aug.
    • D. Frohman-Bentchkowsky, "The metal-nitride-oxide-silicon (MNOS) transistor-characteristics and applications," Proc. IEEE, vol. 58, no. 8, pp. 1207-1219, Aug. 1970.
    • (1970) Proc. IEEE , vol.58 , Issue.8 , pp. 1207-1219
    • Frohman-Bentchkowsky, D.1
  • 11
    • 84858940496 scopus 로고    scopus 로고
    • MOS energy band diagram software
    • (Dec.), [online]
    • R. G. Southwick III. (2005, Dec.). MOS energy band diagram software. Band Diagram, [online]. Available: http://coen.boisestate.edu/bknowlton/Research/
    • (2005) Band Diagram
    • Southwick III, R.G.1
  • 16
    • 0036501296 scopus 로고    scopus 로고
    • Electronic structure of band offsets of high-dielectric-constant gate oxides
    • J. Robertson, "Electronic structure of band offsets of high-dielectric-constant gate oxides," MRS Bull., vol. 27, no. 3, p. 217, 2002.
    • (2002) MRS Bull. , vol.27 , Issue.3 , pp. 217
    • Robertson, J.1
  • 17
    • 28044468090 scopus 로고
    • 3 single-domain crystals
    • Oct.
    • 3 single-domain crystals," Phys. Rev., vol. 76, no. 8, pp. 1221-1225, Oct. 1949.
    • (1949) Phys. Rev. , vol.76 , Issue.8 , pp. 1221-1225
    • Merz, W.J.1
  • 18
    • 28844507948 scopus 로고    scopus 로고
    • 2 high-k gate dielectrics with TaN metal gate electrodes under constant voltage stress
    • Jan.
    • 2 high-k gate dielectrics with TaN metal gate electrodes under constant voltage stress," Microelectron. Reliab., vol. 46, no. 1, pp. 69-76, Jan. 2006.
    • (2006) Microelectron. Reliab. , vol.46 , Issue.1 , pp. 69-76
    • Chatterjee, S.1    Kuo, Y.2    Lu, J.3    Tewg, J.-Y.4    Majhi, P.5
  • 19
    • 1842738104 scopus 로고    scopus 로고
    • Densification and improved electrical properties of pulse-deposited films via in situ modulated temperature annealing
    • Mar.
    • J. F. Conley, Y. Ono, and D. J. Tweet, "Densification and improved electrical properties of pulse-deposited films via in situ modulated temperature annealing," Appl. Phys. Lett., vol. 84, no. 11, pp. 1913-1915, Mar. 2004.
    • (2004) Appl. Phys. Lett. , vol.84 , Issue.11 , pp. 1913-1915
    • Conley, J.F.1    Ono, Y.2    Tweet, D.J.3
  • 21
    • 0042527442 scopus 로고    scopus 로고
    • Trends in the ultimate breakdown strength of high dielectric-constant materials
    • Aug.
    • J. W. McPherson, J. Kim, A. Shanware, H. Mogul, and J. Rodriguez, "Trends in the ultimate breakdown strength of high dielectric-constant materials," IEEE Trans. Electron Devices, vol. 50, no. 8, pp. 1771-1778, Aug. 2003.
    • (2003) IEEE Trans. Electron Devices , vol.50 , Issue.8 , pp. 1771-1778
    • McPherson, J.W.1    Kim, J.2    Shanware, A.3    Mogul, H.4    Rodriguez, J.5
  • 22
    • 0033600230 scopus 로고    scopus 로고
    • The electronic structure at the atomic scale of ultrathin gate oxides
    • Jun.
    • D. A. Muller, T. Sorsch, S. Moccio, F. H. Baumann, K. Evans-Lutterodt, and G. Timp, "The electronic structure at the atomic scale of ultrathin gate oxides," Nature, vol. 399, pp. 758-761, Jun. 1999.
    • (1999) Nature , vol.399 , pp. 758-761
    • Muller, D.A.1    Sorsch, T.2    Moccio, S.3    Baumann, F.H.4    Evans-Lutterodt, K.5    Timp, G.6
  • 25
    • 0033741528 scopus 로고    scopus 로고
    • Experimental evidence for voltage driven breakdown models in ultrathin gate oxides
    • San Jose, CA
    • P. E. Nicollian, W. R. Hunter, and J. C. Hu, "Experimental evidence for voltage driven breakdown models in ultrathin gate oxides," in Proc. Int. Reliab. Phys. Symp., San Jose, CA, 2000, pp. 7-15.
    • (2000) Proc. Int. Reliab. Phys. Symp. , pp. 7-15
    • Nicollian, P.E.1    Hunter, W.R.2    Hu, J.C.3
  • 27
    • 0842266489 scopus 로고    scopus 로고
    • Reliability issues for high-k gate dielectrics
    • A. S. Dates, "Reliability issues for high-k gate dielectrics," in IEDM Tech. Dig., 2003, pp. 923-926.
    • (2003) IEDM Tech. Dig. , pp. 923-926
    • Dates, A.S.1
  • 30
    • 0042111583 scopus 로고    scopus 로고
    • (Ultra) thin oxide breakdown(s), an overview
    • E. Vincent, "(Ultra) thin oxide breakdown(s), an overview," in Proc. Integr. Reliab. Workshop, 1999, pp. 158-166.
    • (1999) Proc. Integr. Reliab. Workshop , pp. 158-166
    • Vincent, E.1
  • 31
    • 0033307321 scopus 로고    scopus 로고
    • Ultrathin hafnium oxide with low leakage and excellent reliability for alternative gate dielectric application
    • B. H. Lee, L. Kang, W.-J. Qi, R. Nieh, Y. Jeon, K. Onishi, and J. C. Lee, "Ultrathin hafnium oxide with low leakage and excellent reliability for alternative gate dielectric application," in IEDM Tech Dig., 1999, pp. 6.1.1-6.1.4.
    • (1999) IEDM Tech Dig.
    • Lee, B.H.1    Kang, L.2    Qi, W.-J.3    Nieh, R.4    Jeon, Y.5    Onishi, K.6    Lee, J.C.7
  • 33
    • 24144463962 scopus 로고    scopus 로고
    • 3 gate dielectrics using progressive electrical stress
    • Sep./Nov.
    • 3 gate dielectrics using progressive electrical stress," Microelectron. Reliab., vol. 45, no. 9-11, pp. 1365-1369, Sep./Nov. 2005.
    • (2005) Microelectron. Reliab. , vol.45 , Issue.9-11 , pp. 1365-1369
    • Miranda, E.1    Molina, J.2    Kim, Y.3    Iwai, H.4


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.