Densification and improved electrical properties of pulse-deposited films via in situ modulated temperature annealing

Applied Physics Letters

Volumn 84, Issue 11, 2004, Pages 1913-1915

  Conley, Jr ^a   Ono, Y ^a   Tweet, D J ^a  

^a SHARP LABORATORIES OF AMERICA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC LAYER DEPOSITION (ALD); MODULATED TEMPERATURE ANNEALING (MTA);

CURRENT DENSITY; DENSIFICATION; DEPOSITION; ELLIPSOMETRY; HIGH TEMPERATURE EFFECTS; MONOLAYERS; OXIDATION; PERMITTIVITY; RAPID THERMAL ANNEALING; THICKNESS MEASUREMENT; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION ANALYSIS;

DIELECTRIC FILMS;

EID: 1842738104     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1667619     Document Type: Article

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