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Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 45, Issue 6 B, 2006, Pages 5445-5449

Dependence of acid yield on chemically amplified electron beam resist thickness

(5) Shigaki, Takumi a Okamotoh, Kazumasa a Kozawa, Takahiro a Yamamoto, Hiroki a Tagawa, Seiichi a

a OSAKA UNIVERSITY (Japan)

Author keywords

Acid concentration; Chemically amplified resist; Electron beam lithography; Resist thickness

Indexed keywords

ACIDIZATION; COMPUTER SIMULATION; CONCENTRATION (PROCESS); LITHOGRAPHY; PHOTORESISTORS; SPECTROSCOPIC ANALYSIS;

ACID YIELDS; LATERAL DIMENSIONS; MICROFABRICATION;

ELECTRON BEAMS;

EID: 33745678746 PISSN: 00214922 EISSN: 13474065 Source Type: Journal
DOI: 10.1143/JJAP.45.5445 Document Type: Review

Times cited : (7)

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