Influence of film thickness, molecular weight, and substrate on the physical properties of photoresist polymer thin films

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5039 II, Issue , 2003, Pages 1008-1018

  Singh, Lovejeet ^a   Ludovice, Peter J ^a   Henderson, Clifford L ^a  

^a Georgia Institute of Technology   (United States)

Author keywords

Ellipsometry; Glass transition temperature; Poly(methyl methacrylate); Polymer thin films

Indexed keywords

APPROXIMATION THEORY; ELECTRON BEAMS; ELLIPSOMETRY; GLASS TRANSITION; MOLECULAR WEIGHT; PLASTIC FILMS; POLYMETHYL METHACRYLATES; REFRACTIVE INDEX; SUBSTRATES; TEMPERATURE; THERMAL EXPANSION; THIN FILMS;

ANGLE SPECTROSCOPIC ELLIPSOMETRY; FILM THICKNESS; HEXAMETHYDISILAZANE; POLYMER THIN FILMS;

PHOTORESISTS;

EID: 0141722730     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.485134     Document Type: Conference Paper

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