Effect of film thickness on the dissolution rate behavior of photoresist polymer thin films

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5376, Issue PART 2, 2004, Pages 1007-1016

  Singh, Lovejeet ^a   Ludovice, Peter J ^a   Henderson, Clifford L ^a  

^a GEORGIA INSTITUTE OF TECHNOLOGY   (United States)

Author keywords

Dissolution rate; Photoresist; Polymer; QCM; Quartz crystal microbalance; Thin film

Indexed keywords

DISSOLUTION RATE; QCM; QUARTZ CRYSTAL MICROBALANCE;

DISSOLUTION; ELECTRONIC EQUIPMENT; GLASS TRANSITION; PHOTORESISTS; POLYMERS; RATE CONSTANTS; THICKNESS MEASUREMENT;

THIN FILMS;

EID: 3843135062     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.536205     Document Type: Conference Paper

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