Accurate in-line CD metrology for nanometer semiconductor manufacturing

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6152 I, Issue , 2006, Pages

  Perng, Baw Ching ^a   Shieh, Jyu Horng ^a   Jang, S M ^a   Liang, M S ^a   Huang, Renee ^a   Chen, Li Chien ^a   Hwang, Ruey Lian ^a   Hsu, Joe ^b   Fong, David ^b  

^a TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY   (Taiwan)

^b VEECO INSTRUMENTS INC   (United States)

Author keywords

Accuracy; CD metrology; CD AFM; CD SEM; Measurement bias; Offset; TEM; VLSI standard

Indexed keywords

ACCURACY; CD METROLOGY; CD-AFM; CD-SEM; MEASUREMENT BIAS; OFFSET; VLSI STANDARD;

ATOMIC FORCE MICROSCOPY; DATA PROCESSING; MEASUREMENT THEORY; PHOTORESISTS; POLYSILICON; SAMPLING; STANDARDS; STATISTICAL METHODS; TRANSMISSION ELECTRON MICROSCOPY; VLSI CIRCUITS;

SEMICONDUCTOR DEVICE MANUFACTURE;

EID: 33745620140     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.655986     Document Type: Conference Paper

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