Photoresist focus exposure matrix (FEM) measurements using critical dimension atomic force microscopy (CD-AFM)

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3332, Issue , 1998, Pages 631-641

  Meyyappan, A ^a   Muckenhirn, S ^a  

^a Veeco Metrology   (United States)

Author keywords

AFM; Calibration; CD; FEM; Lithography; Metrology; Profile; Resist

Indexed keywords

ATOMIC FORCE MICROSCOPY; SCANNING ELECTRON MICROSCOPY; SILICON; TRANSMISSION ELECTRON MICROSCOPY;

CRITICAL DIMENSIONS (CD); FOCUS EXPOSURE MATRICES (FEM);

PHOTORESISTS;

EID: 0032401479     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.308777     Document Type: Conference Paper

References (2)