Application of spectroscopic ellipsometry based scatterometry for ultra thin spacer structure

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5375, Issue PART 2, 2004, Pages 1374-1381

  Chen, Ryan Chia Jen ^a   Chen, Fang Cheng ^a   Luo, Ying Ying ^b   Perng, Baw Ching ^a   Chiu, Yuan Hung ^a   Tao, Hun Jan ^a  

^a TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY   (Taiwan)

^b KLA TENCOR CORPORATION   (United States)

Author keywords

Critical dimension (CD); Metrology; Minispacer; Offset spacer; Scatterometry; Spectroscopic ellipsometry

Indexed keywords

CRITICAL DIMENSION (CD) METROLOGY; MINISPACER; OFFSET SPACERS; SCATTEROMETRY; SPECTROSCOPIC ELLIPSOMETRY;

DATA REDUCTION; ELLIPSOMETRY; GATES (TRANSISTOR); POLYSILICON; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTOR MATERIALS; TRANSMISSION ELECTRON MICROSCOPY;

THIN FILMS;

EID: 4344707706     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.557248     Document Type: Conference Paper

References (5)

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