Factors influencing CD-SEM metrology

Proceedings of SPIE-The International Society for Optical Engineering

Volumn 4689 II, Issue , 2002, Pages 1179-1189

  Sicignano, A ^a   Nikitin, A V ^a   Yeremin, D Y ^a   Sandy, M ^a   Goldburt, E T ^a  

^a Nanometrology LLC   (United States)

Author keywords

CD SEM metrology; Measurement precision; Scan non linearity; Signal to noise ratio; Stability; Sub 100nm metrology

Indexed keywords

CALIBRATION; MEASUREMENT ERRORS; MEASUREMENT THEORY; SCANNING ELECTRON MICROSCOPY; SIGNAL TO NOISE RATIO; SIZE DETERMINATION;

CRITICAL DIMENSION SCANNING ELECTRON MICROSCOPY (CD-SEM); NANOMETROLOGY;

NANOTECHNOLOGY;

EID: 0036030790     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.473447     Document Type: Article

References (7)

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7. th Annual SPIE Meeting, July 30-Aug 4, 2000, San Diego, CA.